前往小程序,Get更优阅读体验!
立即前往
首页
学习
活动
专区
工具
TVP
发布
社区首页 >专栏 >Lithography tutor

Lithography tutor

作者头像
用户1148525
发布2022-11-06 09:41:31
2740
发布2022-11-06 09:41:31
举报
文章被收录于专栏:机器学习、深度学习
在这里插入图片描述
在这里插入图片描述
在这里插入图片描述
在这里插入图片描述

So how does this optical path difference affect the formation of an image? For light, the path length traveled is equivalent to a change in phase. Thus, the OPD can be expressed as a phase error,

Our interpretation of defocus is that it causes a phase error as a function of radial position within the aperture. Light in the center of the aperture has no error, light at the edge of the aperture has the greatest phase error

the effect of defocus is to add a phase error to the higher order diffracted light relative to the zero order. When the lens recombines these orders to form an image, this phase error will result in a degraded image.

how depth-of-focus changes with feature size, the phase error can be expressed as a function of the mask feature:

在这里插入图片描述
在这里插入图片描述

maximum tolerable defocus (called the depth-offocus,DOF)

在这里插入图片描述
在这里插入图片描述

using an aqueous base as the developer, the exposed PAC(photoactive compound) is soluble but the unexposed PAC is not, creating a solubility differential with exposure that forms the basis of resist image formation.

本文参与 腾讯云自媒体同步曝光计划,分享自作者个人站点/博客。
原始发表:2022-10-27,如有侵权请联系 cloudcommunity@tencent.com 删除

本文分享自 作者个人站点/博客 前往查看

如有侵权,请联系 cloudcommunity@tencent.com 删除。

本文参与 腾讯云自媒体同步曝光计划  ,欢迎热爱写作的你一起参与!

评论
登录后参与评论
0 条评论
热度
最新
推荐阅读
领券
问题归档专栏文章快讯文章归档关键词归档开发者手册归档开发者手册 Section 归档